PECVD Tube Furnace

Product application:

PECVD system consists of tube furnace, vacuum acquisition, flow control, and RF power supply. With 13.56 Mhz radio frequency output, the gas containing the atoms of the film is ionized to form plasma in the vacuum body. The strong chemical activity of the plasma is used to improve the reaction conditions and make the film composed of the gaseous substance undergoes a chemical reaction to realize a new preparation technology for the growth of thin film materials, and finally a few pieces of the desired thin film are deposited, which is suitable for the deposition of SiO2 and SiNx thin films at 1200ºC.

• Tube furnace can choose different tube diameter and length o f constant temperature zone, both ends of furnace tube are equipped with high vacuum stainless steel sealing flange
• Vacuum system can choose different vacuum pumps according to test requirements, rotary vane vacuum pump vacuum≤5Pa, molecular pump vacuum unit 1x10⁻⁴Pa
• The gas supply system can choose 3-channel float manual and 3-channel automatic mass flow system
• Vacuum measurement i s digital compound vacuum machine or Pirani vacuum gauge
• Power output optional 200W, 300W, and 500W
• The thermostat has built-in RS485 digital communication port and USB adapter for optional configuration, which can be connected to PC for remote control and monitoring, the control and monitoring system can also save or export the test results

Click on Product manual to download a PDF file